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16th International Conference on Ion Implantation Technology, IIT 2006
(Marseille, France, 11-16, June 2006)

Universal Ion Source™ for Cluster and Monomer Implantation
Thomas N. Horsky - SemEquip, Inc.

Boron Beam Performance and in-situ Cleaning of the ClusterIon® Source
Thomas N. Horsky, Glen F. R. Gilchrist, and Robert W. Milgate III - SemEquip, Inc.

Simplifying the 45nm SDE Process with ClusterBoron® and ClusterCarbon™ Implantation
Wade Krull, Brian Haslam, Tom Horsky - SemEquip, Inc. Kurt Verheyden and Klaus Funk - ASM.

A Vaporizer for Decaborane and Octadecaborane
Doug Adams, Tom Horsky, Glen Gilchrist, Robert Milgate - SemEquip, Inc.
Joe Sweeney, Paul Marganski - ATMI.

A Beam Line System for a Commercial Borohydride Ion Implanter
H. F. Glavish, T.N. Horsky, D.C. Jacobson, F. Sinclair - SemEquip, Inc.
N. Hamamoto, N. Nagai, and M. Naito - Nission Ion Equipment Co., Inc.

5th International Workshop on Junction Technology 2005
(Osaka, Japan, 7-8 June 2005)

Using Boron Cluster Ion Implantation to Fabricate Ultra-Shallow Junctions
Dale Jacobson (Invited), SemEquip, Inc.

Article from Semiconductor International Magazine, January 2005

Applying Equivalent Scaling to USJ Implantation
John O. Borland, J.O.B. Technologies, South Hamilton, Mass.; Masayasu Tanjyo and Nobuo Nagai, Nissin Ion Equipment Co. Ltd., Kyoto, Japan; Takayuki Aoyama, Fujitsu Labs, Akiruno Technology Center, Tokyo; Dale Jacobson, SemEquip Inc., Billerica, Mass.

15th International Conference on Ion Implantation Technology, IIT 2004
(Taipei, Taiwan, 24-29 October 2004)

Ultra-Shallow Junction Formation by B18H22 Ion Implantation
Y. Kawasaki (first author), Renesas Technology Corp.

ClusterIon® Source for Cluster Implantation
Thomas Horsky (first author), SemEquip, Inc.

A New Doping Material for P-Type Ultra-Shallow Junctions B18H22 or ClusterBoron™
Dale Jacobson (first author), SemEquip, Inc.

Ultra-High Resolution Mass Spectroscopy of Boron Cluster Ion Beams
Dale Jacobson (first author), SemEquip, Inc.

Technology Innovation Showcase - SEMICON West 2003
(San Francisco, California, 14 July 2003)

ClusterIon® Ion Source — The Future of Implantation
Tom Horsky and Dale Jacobson

Ultra Shallow Junction Conference Abstract
(Santa Cruz, California, 28 April - 1 May 2003)

Implantation of N- and P-Type Cluster Ions for Shallow Junction Formation
Tom Horsky, Dale Jacobson and Wade Krull

14th International Conference on Ion Implantation Technology, IIT 2002 Abstracts
(Taos, New Mexico, 22-27 September 2002)

SemEquip Ion Source Performance
Tom Horsky, Dale Jacobson and Wade Krull

N- and P-Type Cluster Formation and Negative Ion Production in the SemEquip Ion Source
Tom Horsky, Dale Jacobson and Wade Krull

Emittance Measurements of the SemEquip Ion Source
Dale Jacobson, Tom Horsky and Hilton Glavish